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Change in planar hall effect ratio of Ni-Co films produced by electrodeposition

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dc.contributor.authorKarpuz, Ali
dc.contributor.authorKoçkar, Hakan
dc.contributor.authorAlper, Mürsel
dc.contributor.buuauthorALPER, MÜRSEL
dc.contributor.departmentUludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.
dc.contributor.researcheridAAG-8795-2021
dc.date.accessioned2024-08-07T05:44:21Z
dc.date.available2024-08-07T05:44:21Z
dc.date.issued2015-01-01
dc.descriptionBu çalışma, 02-06, Eylül 2013 tarihlerinde İstanbul[Türkiye]’de düzenlenen International Conference on Nanoscale Magnetism (ICNM-2013) Kongresi‘nde bildiri olarak sunulmuştur.
dc.description.abstractNi-Co Films were produced by the electrodeposition technique and their magnetotransport properties were studied. The anisotropic magnetoresistance (AMR) and the planar Hall effect (PRE) ratios were Found using the van der Pauw setup at room temperature. It was observed that the ORE ratios were larger than the obtained AMR ratios. While the maximum changes in longitudinal and transversal magnetoresistance ratios were 6.8% and 140%, respectively, the change in ORE values was up to 500%. In the ORE measurements, the magnetoresistance orientation depends on the electrical resistance values which occur in branches of the films.
dc.description.sponsorshipBahçeşehir Üniversitesi - 2001/02 - 2005/18
dc.identifier.doi10.1016/j.jmmm.2014.01.067
dc.identifier.endpage119
dc.identifier.issn0304-8853
dc.identifier.startpage115
dc.identifier.urihttps://doi.org/10.1016/j.jmmm.2014.01.067
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S030488531400078X
dc.identifier.urihttps://hdl.handle.net/11452/43769
dc.identifier.volume373
dc.identifier.wos000343799300025
dc.indexed.wosWOS.SCI
dc.indexed.wosWOS.ISTP
dc.language.isoen
dc.publisherElsevier
dc.relation.journalJournal of Magnetism and Magnetic Materials
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi
dc.relation.tubitakTBAG-1771
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectAnisotropic magnetoresistance
dc.subjectThin-films
dc.subjectExtraordinary magnetoresistance
dc.subjectGiant magnetoresistance
dc.subjectRoom-temperature
dc.subjectImpurity layers
dc.subjectMultilayers
dc.subjectField
dc.subjectOptimization
dc.subjectComposites
dc.subjectAnisotropic magnetoresistance
dc.subjectMagnetoresistance
dc.subjectNi-co film
dc.subjectPlanar hall effect
dc.subjectTechnology
dc.subjectMaterials science
dc.subjectPhysics
dc.titleChange in planar hall effect ratio of Ni-Co films produced by electrodeposition
dc.typeArticle
dc.typeProceedings Paper
dspace.entity.typePublication
relation.isAuthorOfPublication15150d2c-46bb-429c-8b74-114d9b223008
relation.isAuthorOfPublication.latestForDiscovery15150d2c-46bb-429c-8b74-114d9b223008

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