Publication:
Electrochemical, structural and magnetic analysis of electrodeposited CoCu/Cu multilayers: Influence of Cu layer deposition potential

dc.contributor.authorKoçkar, Hakan
dc.contributor.authorKuru, Hilal
dc.contributor.authorÜnlü, Cumhur Gökhan
dc.contributor.buuauthorTekgül, Atakan
dc.contributor.buuauthorAlper, Mursel
dc.contributor.departmentFen Edebiyat Fakültesi
dc.contributor.departmentFizik Bölümü
dc.contributor.orcid0000-0001-6737-3838
dc.contributor.researcheridP-2124-2016
dc.contributor.researcheridAAG-8795-2021
dc.contributor.scopusid37462175100
dc.contributor.scopusid7005719283
dc.date.accessioned2023-09-26T10:28:11Z
dc.date.available2023-09-26T10:28:11Z
dc.date.issued2018-03
dc.description.abstractThe electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as , and with respect to saturated calomel electrode (SCE) while the Co layer deposition potential was constant at versus SCE. For the electrochemical analysis, the current-time transients were obtained. The amount of noble non-magnetic (Cu) metal materials decreased with the increase of deposition potentials due to anomalous codeposition. Further, current-time transient curves for the Co layer deposition and capacitance were calculated. In the structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The (111) peak shifts towards higher angle with the increase of the deposition potentials. Also, the lattice parameters of the multilayers decrease from 0.3669 nm to 0.3610 nm with the increase of the deposition potentials from to , which corresponds to the bulk values of Cu and Co, respectively. The electrochemical and structural results demonstrate that the amount of Co atoms increased and the Cu atoms decreased in the layers with the increase of deposition potentials due to anomalous codeposition. For magnetic measurements, the saturation magnetizations, obtained from the magnetic curves of the multilayers were obtained as 212 kA/m, 276 kA/m, and 366 kA/m with , , and versus SCE, respectively. It is seen that the values increased with the increase of the deposition potentials confirming the increase of the Co atoms and decrease of the Cu amount. The results of electrochemical and structural analysis show that the deposition potentials of non-magnetic layers plays important role on the amount of magnetic and non-magnetic materials in the layers and thus on the magnetic properties of the multilayers.
dc.description.sponsorshipTürkiye Cumhuriyeti Kalkınma Bakanlığı - 2005K120170
dc.identifier.citationTekgül, A. vd. (2018). ''Electrochemical, structural and magnetic analysis of electrodeposited CoCu/Cu multilayers: Influence of Cu layer deposition potential''. Journal of Electronic Materials, 47(3), 1896-1903.
dc.identifier.endpage1903
dc.identifier.issn0361-5235
dc.identifier.issn1543-186X
dc.identifier.issue3
dc.identifier.scopus2-s2.0-85037647322
dc.identifier.startpage1896
dc.identifier.urihttps://doi.org/10.1007/s11664-017-5984-9
dc.identifier.urihttps://link.springer.com/article/10.1007/s11664-017-5984-9
dc.identifier.urihttp://hdl.handle.net/11452/34054
dc.identifier.volume47
dc.identifier.wos000424341700017
dc.indexed.wosSCIE
dc.language.isoen
dc.publisherSpringer
dc.relation.bapUAP(F)-2010/56
dc.relation.collaborationYurt içi
dc.relation.journalJournal of Electronic Materials
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectEngineering
dc.subjectMaterials science
dc.subjectPhysics
dc.subjectCoCu/Cu multilayer
dc.subjectElectrodeposition
dc.subjectAnomalous codeposition
dc.subjectElectrochemical properties
dc.subjectStructural properties
dc.subjectMagnetic properties
dc.subjectCO-CU/CU multilayers
dc.subjectGiant magnetoresistance
dc.subjectThin-films
dc.subjectGrowth
dc.subjectThicknesses
dc.subjectEvolution
dc.subjectAtoms
dc.subjectCobalt
dc.subjectCorrosion
dc.subjectDeposition
dc.subjectElectrochemical properties
dc.subjectElectrodeposition
dc.subjectElectrodes
dc.subjectMagnetic materials
dc.subjectMagnetic properties
dc.subjectMagnetism
dc.subjectMultilayers
dc.subjectPower quality
dc.subjectStructural analysis
dc.subjectStructural properties
dc.subjectAnomalous codeposition
dc.subjectCo-Cu/Cu multilayers
dc.subjectCurrent-time transient
dc.subjectElectrochemical analysis
dc.subjectFace centered cubic structure
dc.subjectNon-magnetic materials
dc.subjectSaturated calomel electrode
dc.subjectStructural and magnetic properties
dc.subjectMagnetic multilayers
dc.subject.scopusCopper; Coercivity; Saturation Magnetization
dc.subject.wosEngineering, electrical & electronic
dc.subject.wosMaterials science, multidisciplinary
dc.subject.wosPhysics, applied
dc.titleElectrochemical, structural and magnetic analysis of electrodeposited CoCu/Cu multilayers: Influence of Cu layer deposition potential
dc.typeArticle
dc.wos.quartileQ3
dspace.entity.typePublication
local.contributor.departmentFen Edebiyat Fakültesi/Fizik Bölümü
local.indexed.atScopus
local.indexed.atWOS

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